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CH3f Gas – Fluoromethane for Plasma Etching and Microelectronics pictures & photos
CH3f Gas – Fluoromethane for Plasma Etching and Microelectronics pictures & photos
CH3f Gas – Fluoromethane for Plasma Etching and Microelectronics pictures & photos
CH3f Gas – Fluoromethane for Plasma Etching and Microelectronics pictures & photos
CH3f Gas – Fluoromethane for Plasma Etching and Microelectronics pictures & photos
CH3f Gas – Fluoromethane for Plasma Etching and Microelectronics pictures & photos
  • CH3f Gas – Fluoromethane for Plasma Etching and Microelectronics
  • CH3f Gas – Fluoromethane for Plasma Etching and Microelectronics
  • CH3f Gas – Fluoromethane for Plasma Etching and Microelectronics
  • CH3f Gas – Fluoromethane for Plasma Etching and Microelectronics
  • CH3f Gas – Fluoromethane for Plasma Etching and Microelectronics
  • CH3f Gas – Fluoromethane for Plasma Etching and Microelectronics
CAS No.: 593-53-3
Formula: CH3f
EINECS: 209-794-6
Constituent: Industrial Pure Air
Grade Standard: Electronic Grade
Chemical Property: Non-Flammable Gas
Samples:
US$ 300/kg 1 kg(Min.Order)
| Request Sample
Customization:

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