High-Purity CHF3 Gas – Trifluoromethane for Semiconductor & Plasma Etching

Product Details
Customization: Available
CAS No.: 75-46-7
Formula: CHF3/R23
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  • High-Purity CHF3 Gas – Trifluoromethane for Semiconductor & Plasma Etching
  • High-Purity CHF3 Gas – Trifluoromethane for Semiconductor & Plasma Etching
  • High-Purity CHF3 Gas – Trifluoromethane for Semiconductor & Plasma Etching
  • High-Purity CHF3 Gas – Trifluoromethane for Semiconductor & Plasma Etching
  • High-Purity CHF3 Gas – Trifluoromethane for Semiconductor & Plasma Etching
  • High-Purity CHF3 Gas – Trifluoromethane for Semiconductor & Plasma Etching
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  • Overview
  • Company Profile
  • Our Advantages
  • Packing & Delivery
  • FAQ
Overview

Basic Info.

Model NO.
CGA660
EINECS
200-872-4
Constituent
Industrial Pure Air
Grade Standard
Electronic Grade
Classification
High Purity Material
Grade
Electronic Gas
Keywords
CHF3
Delivery Time
15-30 Days
Shipping Way
by Sea/by Air
MOQ
5 Cylinders
Shelf
1 Year
Color
Colourless
Package
Cylinder
Transport Package
by Air/by Sea
Specification
8L/10L/40L/47L/50L
Trademark
Maotoogas
Origin
China
Production Capacity
2000ton/Year

Product Description

High-Purity CHF3 Gas – Trifluoromethane for Semiconductor & Plasma Etching
1. Description:


Trifluoromethane (CHF3), also known as fluoroform or R23, is a colorless, odorless, non-flammable gas primarily used in refrigeration, fire suppression, and semiconductor manufacturing. It has a high dielectric strength and low boiling point, making it ideal for specialized industrial applications.

2. Physical & Chemical Properties

  • Chemical Formula: CHF3

  • Molecular Weight: 70.01 g/mol

  • CAS Number: 75-46-7

  • EINECS Number: 200-872-4

  • Boiling Point: -82.1°C (-115.8°F)

  • Melting Point: -160°C (-256°F)

  • Density: 3.33 kg/m³ (at 25°C)

  • Vapor Pressure: 4,950 kPa at 25°C

  • Solubility in Water: Slightly soluble

  • Flammability: Non-flammable

  • GWP (Global Warming Potential, 100-year): 14,800

3. Applications

Refrigeration (R23 Refrigerant)

  • Used in cryogenic cooling systems for low-temperature applications (e.g., medical and industrial refrigeration).

  • Common in cascade refrigeration systems, particularly for ultra-low temperature freezers (-80°C).

Fire Suppression

  • Used in gaseous fire suppression systems as an alternative to Halon gases.

  • Ideal for data centers, archives, and electrical rooms, where water-based fire suppression is not suitable.

Semiconductor Industry

  • Utilized in plasma etching for microelectronics and semiconductor manufacturing.

  • Helps create precise circuit patterns on silicon wafers in the production of IC chips, LEDs, and displays.

Other Applications

  • Used in aerospace for specialized cooling applications.

  • Found in some chemical synthesis processes as a fluorination agent.

4. Packaging & Supply

  • Available in high-pressure cylinders, ISO tanks, and bulk supply.

  • High-purity grades (99.99% and 99.999%) available for industrial and electronic applications.

  • Shipped globally with strict quality control and safety standards.

 
 
Company Profile
High-Purity CHF3 Gas – Trifluoromethane for Semiconductor & Plasma Etching
 
Company
MAOTOOGAS EQUIPMENTS (SHANGHAI) CO.,LTD. specializes in the production and sales of mixed gas, high-purity gas, electronic gas, isotope gas and other gas products, as well as gas pipeline supporting engineering services! MAOTOOGAS gas mainly serves semiconductor, led, optical fiber, solar energy, petrochemical, biomedicine, University, scientific research, electric power, electronics, shipping, coal mine, automobile, medical, fire protection, aerospace, food, construction, smelting, fine chemical, processing and manufacturing industries.

High-Purity CHF3 Gas – Trifluoromethane for Semiconductor & Plasma Etching

High-Purity CHF3 Gas – Trifluoromethane for Semiconductor & Plasma Etching
High-Purity CHF3 Gas – Trifluoromethane for Semiconductor & Plasma Etching
High-Purity CHF3 Gas – Trifluoromethane for Semiconductor & Plasma Etching
Our Advantages
 
 
High-Purity CHF3 Gas – Trifluoromethane for Semiconductor & Plasma Etching
High-Purity CHF3 Gas – Trifluoromethane for Semiconductor & Plasma Etching
High-Purity CHF3 Gas – Trifluoromethane for Semiconductor & Plasma Etching
1. 15 years experience for gas manufacturer ans Sales
2. More than 200 customers choice in 50 countries
3. 7~15 work days delivery time.
4. Enough Product in Stock
Packing & Delivery
High-Purity CHF3 Gas – Trifluoromethane for Semiconductor & Plasma Etching
High-Purity CHF3 Gas – Trifluoromethane for Semiconductor & Plasma Etching
FAQ
1. What's your product price?
Because each gas price depends on market supply and demand, quantity, and purity, it is difficult to give a fixed price. If
If you have any interest in any gas, please give your details and requirements. We can negotiate the most reasonable price.
2. What's the minimum order quantity?
Different products have different minimum order quantity. Please don't hesitate to let me know your requirement.
3. What's the delivery time?
If the cylinder needs to be customized, the delivery is about 35 days ex-work after receiving the deposit. That depends on the quantity.
4. How do I check the gas quality?
Firstly, our cylinder will take a treatment (cleaning, drying, vacuum pumping, and replacement) before filling gas. In this way,
the cylinder inside is clear and dry. Secondly, we will take tests on every treated cylinder to assure their inside purity. Thirdly,
We will take a test for all of the gas after filling the cylinders. If the tested gas is not up to standard, we will produce it
again and not release the faulty product to ex work. At last, we will supply you the gas testing qualified report .

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